Cabot Microelectronics Corporation engages in the development, manufacture, and sale of slurries for chemical mechanical planarization process (CMP). CMP is a polishing process used by integrated circuit device manufacturers to planarize or flatten many of the multiple layers of material that are built upon silicon wafers in the production of advanced integrated circuits. The company offers CMP slurries and pads. CMP slurries are liquid solutions generally composed of high-purity deionized water, proprietary chemical additives, and engineered abrasives that chemically and mechanically interact with the surface material of the integrated circuit device at an atomic level. CMP pads are...
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