Ibis Technology Corporation engages in the development, manufacture, and marketing of Separation by Implantation of Oxygen and Silicon-On-Insulator (SIMOX-SOI) implantation equipment for the semiconductor industry worldwide. SIMOX is a form of SOI technology that creates an insulating barrier below the top surface of a silicon wafer. The company’s proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. The buried layer of silicon dioxide acts as an...
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